@Article{CapoteSánchezCapoCoraTrav:2022:EfLoDe,
               author = "Capote S{\'a}nchez, Ariel and Capote, G. and Corat, Evaldo 
                         Jos{\'e} and Trava-Airoldi, Vladimir Jesus",
          affiliation = "{Instituto Nacional de Pesquisas Espaciais (INPE)} and {} and 
                         {Instituto Nacional de Pesquisas Espaciais (INPE)} and {Instituto 
                         Nacional de Pesquisas Espaciais (INPE)}",
                title = "Effect of low-pressure deposition on the mechanical and 
                         tribological properties of a-C:H films deposited via modified 
                         pulsed-DC PECVD with active screen as an additional cathode",
              journal = "Surface and Coatings Technology",
                 year = "2022",
               volume = "445",
                pages = "e128716",
                month = "Sept.",
             keywords = "Additional cathode, Deposition pressure, Diamond-like carbon, 
                         Mechanical properties, PECVD, Tribology.",
             abstract = "Due to their attractive mechanical, chemical, tribological, and 
                         biological properties, diamond-like carbon (DLC) coatings are 
                         widely used in many industrial applications. Normally, the 
                         deposition of amorphous hydrogenated carbon (a-C:H) films is 
                         obtained via the plasma-enhanced chemical vapor deposition (PECVD) 
                         technique. Recently, a modified pulsed-DC PECVD technique has 
                         attracted attention in this field due to its making it possible to 
                         grow a-C:H films at low-pressures (up to 0.1 Pa) in a collision 
                         less regime, leading to the achievement of improved mechanical and 
                         tribological properties. The incorporation of an additional 
                         cathode allows the confinement of electrons and ions, stabilizing 
                         and densifying the cold plasma at much lower pressure than 
                         conventional PECVD systems. This method is distinguished by higher 
                         energy and acceleration of the C+ ions, simpler reactor system 
                         equipment, and lower operating cost. In the present investigation, 
                         hydrogenated amorphous carbon films were grown on AISI 316 
                         stainless steel using a thin amorphous silicon interlayer to 
                         improve interface adherence. The characterization of the coatings 
                         allowed identifying the influence of the deposition pressure on 
                         the microstructural, mechanical, and tribological properties and 
                         the film's adherence. The main results indicate that obtaining 
                         films with high hardness, low compressive stress, low coefficient 
                         of friction, high wear resistance, and appropriate adhesion is 
                         possible at deposition pressures almost 100 times lower than 
                         conventional PECVD techniques.",
                  doi = "10.1016/j.surfcoat.2022.128716",
                  url = "http://dx.doi.org/10.1016/j.surfcoat.2022.128716",
                 issn = "0257-8972",
             language = "en",
           targetfile = "1-s2.0-S0257897222006375-main.pdf",
        urlaccessdate = "04 maio 2024"
}